Integrated circuit structure processing apparatus with chemically corrosion-resistant Al2O3 protective coating on surface of quartz window exposed to corrosive chemicals

摘要

An improved integrated circuit processing apparatus is disclosed wherein a protective coating (40) of Al₂O₃ on the inner surface of a quartz (SiO₂) window (10) in the wall (24) of the integrated circuit processing apparatus provides an enhanced resistance to the corrosive effects of fluorine-containing reagents on the protected inner surface of the quartz window (10). Formation of an Al₂O₃ coating having a minimum thickness of about 4 µm, preferably about 6 µm, and most preferably about 8 µm, up to a maximum thickness of about 15 µm, preferably about 12 µm, with a coating uniformity of ± 15% of the average coating thickness provides the desired protection of the inner surface of the quartz window (10) from corrosive attack by fluorine-containing reagents such as NF₃, SF₆, and fluorine-containing hydrocarbons, e. g. C₂F₆.