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wafer airtight keeping unit and keeping facility thereof

机译:晶片气密性保持装置及其保持设备

摘要

A first aspect of the invention is to provide a wafer keeping facility comprising a wafer keeping box (10) composed of wafer keeping shelves (15, 16) having filters (20) at the rear portions thereof, a loading apparatus (70) having a vertically movable loading mechanism which is mounted thereon and travels along a rail disposed on a front passage before the wafer keeping shelves (15, 16), a fluid circulating device (23) for supplying inert gas to the rear portion of the wafer keeping shelves (15, 16) and generating flowing passage, which directs to the front passage through the filters (20), and exhaust outlets (30B, 31B), first and second path boxes (30, 31) provided at taking-in-and-out outlet of the wafer keeping box (10), a gas reservoir (40) for storing inert gas therein, a first gas supply pipe (41) having a first valve (51), the first gas supply pipe (41) extending from the gas reservoir (40) toward the first pass box (30), a second gas supply pipe (42) having a second valve (52), the second gas supply pipe (42) extending from the gas reservoir (40) toward the second pass box (31), and a fluid control device (50).
机译:本发明的第一方面在于提供一种晶片保持设备,该晶片保持设备包括由晶片保持架(15、16)组成的晶片保持盒(10),该晶片保持架在其后部具有过滤器(20),该装载装置具有用于容纳晶片的装置。垂直移动的装载机构安装在其上,并沿晶片存放架(15、16)之前的前通道上的导轨行进,流体循环装置(23)用于向晶片存放架的后部供应惰性气体( 15、16),并产生流道,该流道通过过滤器(20)和排气口(30B,31B),设置在进出口的第一和第二通道箱(30、31)导向前通道晶片保持箱(10)的出口,用于在其中存储惰性气体的储气罐(40),具有第一阀(51)的第一气体供应管(41),从气体延伸的第一气体供应管(41)朝向第一通道箱(30)的储气罐(40),具有第二阀(52)的第二气体供应管(42) ),第二气体供给管(42)从储气室(40)向第二通过箱(31)延伸,并设有流体控制装置(50)。

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