An electrostatic chuck and an upper projecting pin of an object to be processed are provided on one of the susceptors of the counter electrode for plasma generation. And the upper projecting pin is electrically connected to the susceptor. There is provided a grounding circuit for discharging electric charges that are likely to charge the susceptor in parallel with the RF power supply circuit to the susceptor. Therefore, the charge remaining in the power supply circuit to the susceptor can be discharged, and an abnormal discharge between the upper projecting pin and the susceptor is prevented.
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