Sensitisation of a surface in photon emission under near field microscopy

摘要

The invention relates to a process for sensitising a conductive surface in relation to the emission of photons in tunnelling effect microscopy, including a first step of at least partial sweeping of the said surface by a tunnelling effect microscopy tip while applying, in localised areas of the surface, a first given positive polarisation voltage between the surface and the tip so as to inhibit the emission of photons in the said localised areas and a second step of erasure by at least partial sweeping of the said surface by the said tip while applying, in at least some of the said localised areas of the surface, a second negative polarisation voltage between the surface and the tip so as to reestablish emission of photons there. IMAGE