首页> 外国专利> High albedo, the x-ray detachable reflected Characteristic structure of high resolution the spectroscopic analysis manner null which uses

High albedo, the x-ray detachable reflected Characteristic structure of high resolution the spectroscopic analysis manner null which uses

机译:高反照率,X射线可分离反射高分辨率特征结构使用的光谱分析方式无效

摘要

X-ray dispersive and reflective structures and materials are provided which exhibit improved resolution and reflectivity in specific ranges of interest without substantial fluorescence or absorption edges. The structures are formed of metallic and non-metallic layer pairs and can include a buffer layer between each layer to prevent interdiffusion to stabilize the structures. The materials can be thermally activated to control the desired properties, during or post deposition. The structures can be deposited by ion beam absorption techniques to form the structures in a precise manner. The index of the refraction of the structures can be continuously varying throughout the structures.
机译:提供了X射线色散和反射结构和材料,其在感兴趣的特定范围内显示出改善的分辨率和反射率,而没有明显的荧光或吸收边缘。该结构由金属和非金属层对形成,并且可以在每层之间包括缓冲层以防止相互扩散以稳定结构。可以在沉积过程中或沉积后将材料热活化以控制所需的性能。可以通过离子束吸收技术沉积结构,以精确的方式形成结构。在整个结构中,结构的折射率可以连续变化。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号