POLISHING METHOD, MAGNETIC HEAD OBTAINED BY THE METHOD, X-RAY PARALLELED MEMBER AND X-RAY REFLECTION MEMBER HAVING SURFACE POLISHED BY THE METHOD, AND POLISHING MATERIAL USED FOR THE METHOD

摘要

PURPOSE: To smoothly polish copper or alloy mainly comprising copper by providing polishing material comprising a colloidal suspension, demineralized water, and a chemical activator. ;CONSTITUTION: To obtain a polished surface, polishing material and a surface 5a to be polished are moved to each other while polishing pressure is applied, so the surface 5a of copper or alloy mainly comprising copper is polished. At this time, a composition of polishing components containing a colloidal suspension of SiO₂ particles having an average particle size of 20-50 nm existing in alkali solution, demineralized water, and a chemical activator is used as the polishing material, the polishing pressure of 400-600 g/cm² is applied by a polishing material base to absorb the polishing material, and the polishing material base has a hardness in a range from 40 Shore A hardness to 90 Shore D hardness. In addition, 60-100 pts.vol. of the demineralized water and 25-50 pts.vol. of the chemical activator are used per 100 pts.vol. of the polishing components.;COPYRIGHT: (C)1995,JPO