首页> 外国专利> INJECTION MOLD, EQUIPMENT FOR SURFACE TREATMENT OF THE MOLD AND METHOD FOR SURFACE TREATMENT OF THE MOLD BY THE EQUIPMENT FOR SURFACE TREATMENT

INJECTION MOLD, EQUIPMENT FOR SURFACE TREATMENT OF THE MOLD AND METHOD FOR SURFACE TREATMENT OF THE MOLD BY THE EQUIPMENT FOR SURFACE TREATMENT

机译:注射模,用于模具的表面处理的设备以及通过用于表面处理的设备对模具进行表面处理的方法

摘要

PURPOSE: To provide an injection mold, equipment for surface treatment of the mold and a method for surface treatment of the injection mold by the equipment for surface treatment which enable attainment of an abrasion-resistant layer excellent in adhesion on the surface of the mold and enable the use of the mold for a long period. ;CONSTITUTION: An injection mold is constructed of an Al alloy and has an abrasion-resistant layer 14 on the surface with which a molding material comes into contact, and the abrasion-resistant layer 14 is constructed of a plasma nitrided layer 12 formed on the surface of a mold matrix 11 and of a nitride film 13 provided on the upper surface of the plasma nitrided layer 12. Besides, an ECR plasma source for executing pretreatment of the surface of the mold matrix 11 and molding of the plasma nitrided layer 12 and a vacuum arc evaporation source for forming the nitride film 13 on the plasma nitrided layer 12 are provided in the same vacuum chamber.;COPYRIGHT: (C)1995,JPO
机译:目的:提供一种注射模具,用于模具的表面处理的设备以及通过用于表面模具的设备进行的注射模具的表面处理的方法,其能够获得在模具表面上具有优异粘附性的耐磨层,并且可以长期使用模具。 ;组成:注塑模具由铝合金制成,在与成型材料接触的表面上具有耐磨层14,而耐磨层14由在其上形成的等离子体氮化层12构成。模具基质11的表面和设置在等离子体氮化层12的上表面上的氮化膜13的表面。此外,ECR等离子体源用于执行模具基质11的表面的预处理以及等离子体氮化层12和35的模制。在同一真空室中设有用于在等离子体氮化层12上形成氮化膜13的真空电弧蒸发源。;版权所有:(C)1995,JPO

著录项

  • 公开/公告号JPH0776029A

    专利类型

  • 公开/公告日1995-03-20

    原文格式PDF

  • 申请/专利权人 RICOH CO LTD;

    申请/专利号JP19930222922

  • 发明设计人 SHIBATA KIYOTO;

    申请日1993-09-08

  • 分类号B29C45/26;B29C33/38;B29C45/37;C23C8/36;

  • 国家 JP

  • 入库时间 2022-08-22 04:24:22

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