MICRO-LITHOGRAPHIC RESIST COMPOSITION, ACID INSTABILITY COMPOUND, FORMATION OF MICRO-LITHOGRAPHIC RELIEF IMAGE AND ACID SENSITIVE POLYMER COMPOSITION

摘要

PURPOSE: To provide a compsn. which is hardly subjected to a disadvantageous reaction with environment pollutant material and to enhance the allowance to the variable or long delay between exposure and baking after the exposure or between the baking after the exposure and developing. CONSTITUTION: This aq. base developable microlithographic resist compsn. contains a film formable polymer, such as polyhydroxy styrene having chemically bonded iterative hydroxyl groups, an acid unstable compd. contg. a ketal component, such as 2-(2-methoxypropyl) and an acid generating compd., such as N-(trifluoromethyl sulfonyloxy)-nitronaphthalimide, which forms an acid by exposure to chemical rays in the mixture. The acid generated by the exposure induces cleavage of at least part of the compds. contg. the ketal component and the exposed compsn. is made selectively more soluble in the aq. base as compared with the non-exposed compsn.