首页> 外国专利> QUANTITATIVE ANALYSIS OF POLYMER SURFACE BY X-RAY PHOTOELECTRON SPECTROSCOPY

QUANTITATIVE ANALYSIS OF POLYMER SURFACE BY X-RAY PHOTOELECTRON SPECTROSCOPY

机译:X射线光电子能谱法定量分析聚合物表面

摘要

PURPOSE: To allow simple and highly accurate quantitative analysis of polymer surface through the use of a relative sensitivity coefficient determined from a polymer of same elemental system as a sample. ;CONSTITUTION: The clean surface of a polymer having known elemental composition or unit chemical structure of same elemental composition as a sample is measured to determine the peak value along with the atomic concentration (except hydrogen) of the compositional elements thus determining a relative sensitivity coefficient. Since the polymer is scarcely deteriorated in the atmosphere and provides a clean surface easily when subjected to ultrasonic cleaning with an organic solvent, the relative sensitivity coefficient can be determined accurately. Furthermore, measurement can be simplified because the relative sensitivity coefficients can be determined for a plurality of elements from one sample. The surface composition of polymer can be determined easily with high accuracy because the matrix effect, caused by the composition, density, crystallinity, etc., of matrix, can be corrected.;COPYRIGHT: (C)1995,JPO
机译:目的:通过使用由与样品相同元素系统的聚合物确定的相对灵敏度系数,可以对聚合物表面进行简单,高精度的定量分析。 ;组成:测量具有已知元素组成或与样品具有相同元素组成的单位化学结构的聚合物的清洁表面,以确定峰值以及组成元素的原子浓度(氢除外),从而确定相对灵敏度系数。由于在用有机溶剂进行超声波清洗时,该聚合物几乎不会在大气中劣化并且容易提供清洁的表面,因此可以准确地确定相对灵敏度系数。此外,由于可以从一个样本确定多个元素的相对灵敏度系数,因此可以简化测量。由于可以校正由基质的组成,密度,结晶度等引起的基质效应,因此可以轻松,高精度地确定聚合物的表面组成。;版权所有:(C)1995,JPO

著录项

  • 公开/公告号JPH0735711A

    专利类型

  • 公开/公告日1995-02-07

    原文格式PDF

  • 申请/专利权人 SUMITOMO METAL MINING CO LTD;

    申请/专利号JP19930200135

  • 发明设计人 OTSUKA YOSHIHIRO;

    申请日1993-07-21

  • 分类号G01N23/227;

  • 国家 JP

  • 入库时间 2022-08-22 04:21:52

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