首页>
外国专利>
QUANTITATIVE ANALYSIS OF POLYMER SURFACE BY X-RAY PHOTOELECTRON SPECTROSCOPY
QUANTITATIVE ANALYSIS OF POLYMER SURFACE BY X-RAY PHOTOELECTRON SPECTROSCOPY
展开▼
机译:X射线光电子能谱法定量分析聚合物表面
展开▼
页面导航
摘要
著录项
相似文献
摘要
PURPOSE: To allow simple and highly accurate quantitative analysis of polymer surface through the use of a relative sensitivity coefficient determined from a polymer of same elemental system as a sample. ;CONSTITUTION: The clean surface of a polymer having known elemental composition or unit chemical structure of same elemental composition as a sample is measured to determine the peak value along with the atomic concentration (except hydrogen) of the compositional elements thus determining a relative sensitivity coefficient. Since the polymer is scarcely deteriorated in the atmosphere and provides a clean surface easily when subjected to ultrasonic cleaning with an organic solvent, the relative sensitivity coefficient can be determined accurately. Furthermore, measurement can be simplified because the relative sensitivity coefficients can be determined for a plurality of elements from one sample. The surface composition of polymer can be determined easily with high accuracy because the matrix effect, caused by the composition, density, crystallinity, etc., of matrix, can be corrected.;COPYRIGHT: (C)1995,JPO
展开▼