首页> 外国专利> METHOD FOR EVALUATING GATE OXIDE LAYER OF NON-VOLATILE MEMORY AND TEST EQUIPMENT THEREFOR

METHOD FOR EVALUATING GATE OXIDE LAYER OF NON-VOLATILE MEMORY AND TEST EQUIPMENT THEREFOR

机译:评估非挥发性记忆体氧化层的方法及其测试设备

摘要

PURPOSE: To detect the presence of a defective cell by analyzing current-voltage characteristic by using a test equipment which is the same as a memory array to be evaluated, except when each cell is connected in parallel. ;CONSTITUTION: In a test equipment 10, to which access can be performed from the outside by single pads 15, 18, and 21, an electric stress is applied to the gate oxide layers of EPROM, EEPROM, and flash EEPROM memories, so that electrons can be extracted from the floating gate region of a deflective cell, and a threshold characteristic of the cell are changed, while the charge of a non-defective cell remains without being charged. Then, a voltage lower than the threshold is applied, and drain currents related to the presence of at least one defective cell in an equipment passing through the cell are measured. The measurement and analysis of the current-voltage characteristic are conducted for deciding the number of defective cells. Gate currents can be measured indirectly through the measurement of the drain and source currents of the cells, and the detection of the defective cells can be attained.;COPYRIGHT: (C)1995,JPO
机译:目的:通过使用与要评估的存储阵列相同的测试设备分析电流-电压特性来检测缺陷单元的存在,但每个单元并联时除外。组成:在测试设备10中,可以通过单个焊盘15、18和21从外部对其进行访问,将电应力施加到EPROM,EEPROM和闪存EEPROM存储器的栅极氧化层上,以便可以从偏转单元的浮栅区中提取电子,并改变该单元的阈值特性,而无缺陷单元的电荷保持不带电。然后,施加低于阈值的电压,并且测量与通过电池的设备中至少一个有缺陷的电池的存在有关的漏极电流。进行电流-电压特性的测量和分析以确定缺陷电池的数量。栅极电流可以通过测量单元的漏极和源极电流来间接测量,并且可以检测出有缺陷的单元。;版权所有:(C)1995,JPO

著录项

  • 公开/公告号JPH077140A

    专利类型

  • 公开/公告日1995-01-10

    原文格式PDF

  • 申请/专利权人 SGS THOMSON MICROELETTRONICA SPA;

    申请/专利号JP19930272484

  • 发明设计人 CAPPELLETTI PAOLO G;RAVAZZI LEONARDO;

    申请日1993-10-29

  • 分类号H01L27/115;G11C16/06;G11C29/00;H01L21/8247;H01L29/788;H01L29/792;

  • 国家 JP

  • 入库时间 2022-08-22 04:20:32

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