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Atmospheric oxygen removal device for high temperature diffusion furnace
Atmospheric oxygen removal device for high temperature diffusion furnace
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机译:高温扩散炉常压除氧装置
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摘要
Our research institute is a high temperature diffusion device. The N ejector with roof shape is set at the wafer loading atmospheric position at the entrance of the furnace tube, and the N atmosphere is set around the chip, which can prevent the air oxygen from flowing into the tube and the silicon chip from colliding. High temperature diffusion is described as the use of atmospheric deaerator.
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