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A method for the deposition of thin films.
A method for the deposition of thin films.
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机译:一种沉积薄膜的方法。
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摘要
The invention relates to a process for depositing thin films by cvd plasma -. It is characterized by the use as the electrode in order to create the discharge of the substrate itself - same which has - if necessary - previously been rendered conductive by the deposition of conductive layers. The technique is applicable in particular to deposition of layers organo - silicon on glass plates of large dimensions.
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