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Application specific integrated circuit and placement and routing software with non-customizable first metal layer and vias and customizable second metal grid pattern

机译:具有不可定制的第一金属层和通孔以及可定制的第二金属网格图案的专用集成电路以及布局和布线软件

摘要

An embodiment of the present invention is a customizable integrated circuit including a basic cell diffusion of four transistors in a substrate. A first metallization layer includes a plurality of connective strips that electrically connect to the basic cell by a plurality of contacts. A second metallization layer, after a first patterning and chemical etch, comprises an orthogonal matrix of conductors that are electrically connected to corresponding connective strips by a plurality of vias that are respectively positioned at an intersection of orthogonal conductors. A second patterning and chemical etch of the second metallization layer configures the basic cell according to a user's specification.
机译:本发明的实施例是可定制的集成电路,其包括基板中的四个晶体管的基本单元扩散。第一金属化层包括通过多个触点电连接到基本电池的多个连接条。在第一图案化和化学蚀刻之后,第二金属化层包括导体的正交矩阵,所述导体的正交矩阵通过分别位于正交导体的相交处的多个通孔电连接到对应的连接带。第二金属化层的第二图案化和化学蚀刻根据用户要求配置基本单元。

著录项

  • 公开/公告号US5404033A

    专利类型

  • 公开/公告日1995-04-04

    原文格式PDF

  • 申请/专利权人 SWIFT MICROELECTRONICS CORPORATION;

    申请/专利号US19930174896

  • 发明设计人 DANIEL WONG;ANTHONY Y. WONG;

    申请日1993-12-23

  • 分类号H01L27/10;

  • 国家 US

  • 入库时间 2022-08-22 04:05:11

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