Radiation-sensitive positive resist composition comprising an alkali- soluble resin made from m-cresol, 2-tert-butl-5-methyl phenol and formaldehyde

摘要

A positive resist composition containing a 1,2-quinone diazide compound and an alkali-soluble resin which constitutes a resin (I) obtainable through a condensation reaction of a phenol mixture containing m-cresol and 2-tert.-butyl-5-methylphenol with an aldehyde., which has well balanced sensitivity, resolution and heat resistance properties.