DEVICE AND METHOD FOR FORMING CRYSTALLINE THIN FILM, PLASMA IRRADIATOR, AND METHOD OF PLASMA IRRADIATION

摘要

PURPOSE: To easily form on any substrate a single crystal thin film with desired crystal azimuth and an axially oriented polycrystal thin film with desired orientation by using a plasma irradiator with a mechanism of accelerating plasma through divergent magnetic field, by setting up an electron check means specifying an opening on the irradiation path, and making the minimum diameter of the opening smaller than the Larmor diameter of an electron and the depth of the opening greater than the device length of electron. ;CONSTITUTION: The figure is an oblique view presenting an example of the constitution of a sheath remover. A sheath remover 18a is constituted of an electrically conductive material such as a metal, being a flat plate with a circular opening at the center, and put in a plasma so as to be rectangular to magnetic lines of force BECR. In this case, electrons each with Larmor diameter DL greater than the opening diameter DS and the device length LD shorter than the depth TS of the opening are impassable through the opening, impinging on the main surface of the sheath remover 18a or the inner wall of the opening without exception, the electrons impinged are rapidly removed to ground voltage and neither accumulated or scattered.;COPYRIGHT: (C)1996,JPO