首页> 外国专利> RECESSED PART RECORDING METHOD FOR OPTICAL MASTER DISK, PRODUCTION OF OPTICAL MASTER DISK, PRODUCTION OF OPTICAL DISK, OPTICAL DISK, AND LATENT IMAGE RECORDER FOR OPTICAL MASTER DISK

RECESSED PART RECORDING METHOD FOR OPTICAL MASTER DISK, PRODUCTION OF OPTICAL MASTER DISK, PRODUCTION OF OPTICAL DISK, OPTICAL DISK, AND LATENT IMAGE RECORDER FOR OPTICAL MASTER DISK

机译:光学光盘的后备零件记录方法,光学光盘的制作,光学光盘的制作,光学光盘以及光学光盘的潜像记录器

摘要

PURPOSE: To obtain a recessed part recording method capable of forming recessed parts which are of the same accuracy in their depth and width and are respectively different in the depths on a master disk and a process for producing the optical master disk. ;CONSTITUTION: A photoresist 5 is applied on a substrate 1. The part where the deep recessed part is to be formed, of the photoresist covering the region where reproduction-only region 2 is to be formed, is irradiated with a first light beam B1 and is exposed from the front surface of the photoresist 5 down to the substrate surface. The part where the shallow recessed part is to be formed, of the photoresist 5 covering the region where recording region 3 is to be formed is irradiated with the first light beam B1. The photoresist 5 is sensitized from the front surface of the photoresist down to the substrate surface and the entire part of the region where the recording region 3 is to be formed, is irradiated with a second light beam B2 to expose the parts nearer the front surface side than the parts of the thickness corresponding to the depth of the shallow recessed part from the substrate surface exclusive of the part of the thickness corresponding to the depth of the shallow recessed part. The photoresist is developed after the irradiation with the light beams, thereby, the optical master disk having two kinds of the recessed parts; the shallow recessed part and deep recessed part, is obtd.;COPYRIGHT: (C)1996,JPO
机译:目的:获得一种凹部记录方法,该方法能够在母盘上形成深度和宽度精确度相同并且深度不同的凹部,以及制造光学主盘的方法。 ;组成:在衬底1上施加光刻胶5。用第一光束B1照射要形成深凹部的部分,该光刻胶覆盖要形成仅再现区域2的区域。并从光致抗蚀剂5的前表面向下暴露到基板表面。用第一光束B1照射覆盖要形成记录区域3的区域的光刻胶5中要形成浅凹部的部分。从光致抗蚀剂的前表面向下敏化光致抗蚀剂5到基板表面,并且将要形成记录区域3的区域的整个部分被第二光束B2照射以暴露更靠近前表面的部分。另外,从基板表面起,与该浅凹部的深度相对应的部分的厚度比与该浅凹部的深度相对应的部分的厚度大。在用光束照射之后,使光致抗蚀剂显影,从而,光学母盘具有两种凹入部分;即,凹入部分是凹进部分。浅凹部分和深凹部分是钝的。;版权所有:(C)1996,日本特许厅

著录项

  • 公开/公告号JPH08249728A

    专利类型

  • 公开/公告日1996-09-27

    原文格式PDF

  • 申请/专利权人 NIPPON COLUMBIA CO LTD;

    申请/专利号JP19950055989

  • 发明设计人 DOI SEIJI;

    申请日1995-03-15

  • 分类号G11B7/26;G11B7/00;G11B7/24;

  • 国家 JP

  • 入库时间 2022-08-22 04:02:35

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