首页> 外国专利> ELECTRON BEAM PUMPING LASER, MANUFACTURE OF ELECTRON BEAM PUMPING LASER, AND DRIVE METHOD OF ELECTRON BEAM PUMPING LASER

ELECTRON BEAM PUMPING LASER, MANUFACTURE OF ELECTRON BEAM PUMPING LASER, AND DRIVE METHOD OF ELECTRON BEAM PUMPING LASER

机译:电子束泵浦激光器,电子束泵浦激光器的制造,驱动方法

摘要

PURPOSE: To provide an electrom beam pumping laser with a high threshold level of laser oscillation by obtaining a high optical reflectively while maintaining high utilization of incident energy. ;CONSTITUTION: This electrom beam pumping laser is provided with an active layer 2, and optical reflecting layers 1 and 3 which are formed so as to sandwich the active layer 2. An electron beam 5 is made to enter the active layer 2 from the side surface of the active layer 2, and a laser beam is radiated perpendicularly to the active layer 2. At least one side of the optical reflecting layers 1 and 3 is provided with a plurality of very small concave mirror parts or a plurality of very small Fresnel reflecting mirror parts. The focal length of the very small concave mirror part of the very small Fresnel reflecting mirror parts or semicircular type reflecting mirror parts is set to be greater than or equal to the width of the active layer 2.;COPYRIGHT: (C)1996,JPO
机译:目的:提供一种具有高阈值水平的激光振荡的电子束泵浦激光器,通过获得高的光学反射率,同时又保持对入射能量的高利用率。 ;构成:该电子束泵浦激光器具有有源层2以及形成为将有源层2夹在中间的光反射层1和3。使电子束5从侧面进入有源层2。在有源层2的表面上,垂直于有源层2发射激光束。光反射层1和3的至少一侧设置有多个非常小的凹面镜部分或多个非常小的菲涅耳透镜。反射镜零件。将非常小的菲涅耳反射镜部分或半圆形反射镜部分的非常小的凹面镜部分的焦距设置为大于或等于有源层2的宽度; COPYRIGHT:(C)1996,JPO

著录项

  • 公开/公告号JPH08222786A

    专利类型

  • 公开/公告日1996-08-30

    原文格式PDF

  • 申请/专利权人 MATSUSHITA ELECTRIC IND CO LTD;

    申请/专利号JP19950027082

  • 发明设计人 TODA TAKAO;OKAJIMA MICHIO;NISHITANI TERU;

    申请日1995-02-15

  • 分类号H01S3/0959;H01S3/085;H01S3/103;H01S3/18;H04N9/31;

  • 国家 JP

  • 入库时间 2022-08-22 04:01:47

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