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SPUTTER TARGET COMPOSED OF COBALT-BASED ALLOY HAVING HIGH MAGNETIC SUSCEPTIBILITY
SPUTTER TARGET COMPOSED OF COBALT-BASED ALLOY HAVING HIGH MAGNETIC SUSCEPTIBILITY
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机译:具有高磁化率的基于钴的合金的溅射靶标
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摘要
PROBLEM TO BE SOLVED: To obtain a target for magnetron cathode sputtering having large magnetic susceptibility by specifying Curie temperature and composition ratio of a Co-based alloy containing an additive comprising Cr, being partly replace able with Mo or the like, and Pt or the like. ;SOLUTION: In a target for magnetron cathode sputtering consisting of a Co-based alloy containing an additive composed of Cr and at least one of the elements Pt, Pd, Ni, Ti, V, Ta, W or B, Curie temperature Tc of the alloy, defined as the point of intersection 7 of a high temperature asymptote 8 of the magnetization curve 6 and the tangent 5 of the magnetization curve 6 at its steepest descending region, is kept ≤80°C. Besides, the alloy contains 0≤Pt≤16 at.% and 10 at.%≤(Cr+R)≤23 at.% (R is at least one of the elements Mo, Pd, Ni, Ti, V, Ta, W, B), and a part of Cr can be substituted with R. The target material based on the CoPtCr alloy having large magnetic susceptibility is obtained thereby.;COPYRIGHT: (C)1996,JPO
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