首页> 外国专利> SPUTTER TARGET COMPOSED OF COBALT-BASED ALLOY HAVING HIGH MAGNETIC SUSCEPTIBILITY

SPUTTER TARGET COMPOSED OF COBALT-BASED ALLOY HAVING HIGH MAGNETIC SUSCEPTIBILITY

机译:具有高磁化率的基于钴的合金的溅射靶标

摘要

PROBLEM TO BE SOLVED: To obtain a target for magnetron cathode sputtering having large magnetic susceptibility by specifying Curie temperature and composition ratio of a Co-based alloy containing an additive comprising Cr, being partly replace able with Mo or the like, and Pt or the like. ;SOLUTION: In a target for magnetron cathode sputtering consisting of a Co-based alloy containing an additive composed of Cr and at least one of the elements Pt, Pd, Ni, Ti, V, Ta, W or B, Curie temperature Tc of the alloy, defined as the point of intersection 7 of a high temperature asymptote 8 of the magnetization curve 6 and the tangent 5 of the magnetization curve 6 at its steepest descending region, is kept ≤80°C. Besides, the alloy contains 0≤Pt≤16 at.% and 10 at.%≤(Cr+R)≤23 at.% (R is at least one of the elements Mo, Pd, Ni, Ti, V, Ta, W, B), and a part of Cr can be substituted with R. The target material based on the CoPtCr alloy having large magnetic susceptibility is obtained thereby.;COPYRIGHT: (C)1996,JPO
机译:解决的问题:通过指定居里温度和含有包含Cr的添加剂的Co基合金的组成比,该Co基合金的居里温度和组成比可以部分地被Mo等,Pt或Pt替代,从而获得具有大磁化率的磁控阴极溅射靶。喜欢。 ;解决方案:在磁控管阴极溅射靶中,该靶由Co基合金组成,其中含有Cr和至少一种Pt,Pd,Ni,Ti,V,Ta,W或B元素组成的添加剂,居里温度Tc为定义为磁化曲线6的高温渐近线8与磁化曲线6的切线5的最陡下降区的交点7的合金保持≤80°C。此外,该合金包含0≤Pt≤16原子%和10原子%≤(Cr + R)≤23原子%(R是Mo,Pd,Ni,Ti,V,Ta, W,B),Cr的一部分可以被R取代,从而获得基于CoPtCr合金的大磁化率的靶材。(COP)版权所有(C)1996,JPO

著录项

  • 公开/公告号JPH08260136A

    专利类型

  • 公开/公告日1996-10-08

    原文格式PDF

  • 申请/专利权人 LEYBOLD MATERIALS GMBH;

    申请/专利号JP19960049969

  • 发明设计人 SCHLOTT MARTIN;HEINDEL JOSEF;

    申请日1996-03-07

  • 分类号C23C14/34;C23C14/14;

  • 国家 JP

  • 入库时间 2022-08-22 04:00:56

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