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GRAPHITE LAYER FORMING METHOD, X-RAY OPTICAL ELEMENT HAVING GRAPHITE LAYER FORMED BY THE METHOD AND PRODUCTION OF THE X-RAY OPTICAL ELEMENT

机译:石墨层形成方法,具有该方法形成的石墨层的x射线光学元件及x射线光学元件的制造

摘要

PURPOSE: To form a smooth and uniform graphite crystal layer by forming a metallic thin film on the surface of a vitreous substrate and forming a graphite layer on the metallic thin film by chemical vapor deposition. ;CONSTITUTION: A metallic thin film 2 (nickel, cobalt, etc.) is formed on the surface of a vitreous substrate 3' (aluminum single crystal, etc., having ≥0.3mm thickness) by normal vapor deposition in 10-500nm thickness. Further, a graphite layer 1 is formed on the metallic thin film 2 by chemical vapor deposition in a nonoxidizing atmosphere at ≤1500°C (preferably 700-1000°C) in vacuum or at ≤210Pa pressure. Carbon monoxide, 2-methyl-1,2'-naphthyl ketone, etc., are used as the raw material to form the graphite layer 1. The highly oriented graphite layer 1 is obtained in this way.;COPYRIGHT: (C)1996,JPO
机译:目的:通过在玻璃基板的表面上形成金属薄膜,并通过化学气相沉积在金属薄膜上形成石墨层,从而形成光滑均匀的石墨晶体层。 ;组成:在玻璃基板3'(铝单晶等,厚度≥0.3mm)的表面上通过常规气相沉积以10-500nm的厚度形成金属薄膜2(镍,钴等) 。此外,在真空中或在≤210Pa压力下在≤1500℃(优选700-1000℃)的非氧化气氛中,通过化学气相沉积在金属薄膜2上形成石墨层1。一氧化碳,2-甲基-1,2'-萘基酮等用作形成石墨层1的原料。以此方式获得了高度取向的石墨层1。版权所有:(C)1996 ,日本特许厅

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