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GRAPHITE LAYER FORMING METHOD, X-RAY OPTICAL ELEMENT HAVING GRAPHITE LAYER FORMED BY THE METHOD AND PRODUCTION OF THE X-RAY OPTICAL ELEMENT
GRAPHITE LAYER FORMING METHOD, X-RAY OPTICAL ELEMENT HAVING GRAPHITE LAYER FORMED BY THE METHOD AND PRODUCTION OF THE X-RAY OPTICAL ELEMENT
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机译:石墨层形成方法,具有该方法形成的石墨层的x射线光学元件及x射线光学元件的制造
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摘要
PURPOSE: To form a smooth and uniform graphite crystal layer by forming a metallic thin film on the surface of a vitreous substrate and forming a graphite layer on the metallic thin film by chemical vapor deposition. ;CONSTITUTION: A metallic thin film 2 (nickel, cobalt, etc.) is formed on the surface of a vitreous substrate 3' (aluminum single crystal, etc., having ≥0.3mm thickness) by normal vapor deposition in 10-500nm thickness. Further, a graphite layer 1 is formed on the metallic thin film 2 by chemical vapor deposition in a nonoxidizing atmosphere at ≤1500°C (preferably 700-1000°C) in vacuum or at ≤210Pa pressure. Carbon monoxide, 2-methyl-1,2'-naphthyl ketone, etc., are used as the raw material to form the graphite layer 1. The highly oriented graphite layer 1 is obtained in this way.;COPYRIGHT: (C)1996,JPO
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