首页> 外国专利> FORMATION OF THIN FILM USING LASER ABRASION AND LASER ABRASION DEVICE

FORMATION OF THIN FILM USING LASER ABRASION AND LASER ABRASION DEVICE

机译:利用激光磨蚀和激光磨蚀装置形成薄膜

摘要

PURPOSE: To provide a thin film forming method and device therefor for which laser abrasion to enable structural control of a thin film is used. ;CONSTITUTION: This laser abrasion device is composed of plural targets 8 which are disposed on a target holder 11 movable in parallel within a vacuum chamber 6 and vary in mounting heights, a condenser optical device for irradiating the surfaces of the targets 8 with a laser beam 2 emitted from a pulse laser oscillator 1 with lenses of different focal lengths at a rotating mechanism 14 and a substrate 9 to be deposited with the products from the targets 8. The targets 8 are moved in parallel during the formation of thin films in order to change the relative distance between the targets 8 and the substrate 9 during the formation of the thin films and the targets are irradiated with the laser beam by exchanging the lenses by the rotating mechanism 14.;COPYRIGHT: (C)1996,JPO
机译:用途:提供一种薄膜形成方法和装置,为此,使用激光磨蚀来实现薄膜的结构控制。 ;组成:该激光研磨装置由多个靶8组成,该多个靶8设置在可在真空室6中平行移动且安装高度不同的靶支架11上,聚光光学器件用于用激光照射靶8的表面。脉冲激光振荡器1发射的光束2在旋转机构14处具有不同焦距的透镜,基板9将沉积有靶材8的产品。在形成薄膜期间,靶材8平行移动在薄膜形成过程中改变靶材8和基板9之间的相对距离,并通过旋转机构14更换透镜,用激光束照射靶材;版权:(C)1996,JPO

著录项

  • 公开/公告号JPH08144051A

    专利类型

  • 公开/公告日1996-06-04

    原文格式PDF

  • 申请/专利权人 MATSUSHITA ELECTRIC IND CO LTD;

    申请/专利号JP19940286597

  • 发明设计人 NISHIKAWA YUKIO;YOSHIDA ZENICHI;

    申请日1994-11-21

  • 分类号C23C14/28;B23K26/12;

  • 国家 JP

  • 入库时间 2022-08-22 03:58:12

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