MINUTE FOREIGN SUBSTANCE POSITIONING METHOD, ANALYZING METHOD, AND ANALYZING APPARATUS USED THEREFOR, AND MANUFACTURE OF SEMICONDUCTOR ELEMENT OR LIQUID CRYSTAL DISPLAY ELEMENT USING IT

摘要

PURPOSE:To provide methods to easily detect the position of a minute foreign substance existing on the surface of a flat specimen of such as a silicon wafer, etc., and to carry out analysis, inspection, evaluation, and process. CONSTITUTION:To a minute foreign substance 7 whose position is made clear in a coordinate plane which a particle inspection apparatus has, light beam 6 is spot-radiated in the whole range of the surface of a specimen 2, the position of the minute foreign substance 7 is determined, selective surface observation is done by using a function which an analyzer has, and composition analysis and surface treatment are also done. Moreover, even to a fine foreign substance which can not be detected by the particle inspection apparatus, the light beam 6 is spot-radiated, the position of the minute foreign substance 7 is determined, selective surface observation, composition analysis and surface treatment, etc., are made by using a function which an analyzer has.