首页> 外国专利> OXIDATION OF SURFACE OF BODY TO BE TREATED OR MATERIAL ON THE SAME SURFACE UNDER REDUCED PRESSURE

OXIDATION OF SURFACE OF BODY TO BE TREATED OR MATERIAL ON THE SAME SURFACE UNDER REDUCED PRESSURE

机译:减压下要处理的物体表面或材料在同一表面上的氧化

摘要

PURPOSE: To further increase cleaning speed and to enable uniform treatment even to a rugged surface by carrying out cleaning under reduced pressure in UV/O3 cleaning with a dielectric barriered discharge lamp contg. gaseous xenon. ;CONSTITUTION: Oxygen or oxygen-contg. fluid is irradiated under reduced pressure with vacuum UV radiated from a dielectric barriered discharge lamp contg. gaseous xenon or xenon-based gas to form ozone and active oxidizing decomposed matter by a photochemical reaction. These products are brought into contact with the surface of a body to be treated or a material on its surface. Cleaning speed is increased under reduced pressure as compared with the conventional speed and high concn. ozone or active oxidizing matter is obtd. without using an ozonizer. High treatment speed is attained, the interval between the light source and the body to be treated can be widened and even the rugged surface of a body to be treated can be uniformly treated.;COPYRIGHT: (C)1996,JPO
机译:目的:通过在电介质阻挡放电灯(续)中进行减压的UV / O 3 清洁,在减压下进行清洁,以进一步提高清洁速度并实现均匀处理,甚至在粗糙的表面上。气态氙气。 ;组成:氧气或含氧量。在减压下用电介质阻挡放电灯(续)辐射的真空紫外线照射流体。气态氙气或氙气通过光化学反应形成臭氧和活性氧化分解物。这些产品与被治疗物体的表面或物体表面的材料接触。与传统的速度和高浓度相比,在减压下提高了清洁速度。禁止使用臭氧或活性氧化物质。无需使用臭氧发生器。获得了很高的治疗速度,可以扩大光源与被治疗体之间的间隔,甚至可以均匀地治疗被治疗体的粗糙表面。;版权所有:(C)1996,日本特许厅

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