GAS PHASE GROWTH MECHANISM AND HEATING APPARATUS IN HEAT TREATMENT MECHANISM

摘要

PURPOSE: To form the effective volume as a uniform heating region, increase amount of material to be processed depending on the volume of the uniform heating region and save the heat and reduce the volume of the apparatus as a whole by closing an aperture at the end pat having the highest heat radiating coefficient in a cylindrical heating furnace with a subheating body and removing an installation mechanism of the subheating region previously formed in the furnace. ;CONSTITUTION: In the apparatus where the full length of a reaction tube 1 is covered with a cylindrical heating apparatus 4 at the external circumference of such reaction tube 1 consisting of quartz or silicon cabide which can internally load a supporting body 6 maintaining the preset attitude of a plurality of materials 5 to be processed by vapor phrase growth, heat diffusion or heat treatment, the apertures provided at both ends of the heating apparatus 4 are closed by the subheating bodies 4a to wrap the internally provided reaction tube 1.;COPYRIGHT: (C)1996,JPO