Heating apparatus in vapor phase growth mechanism and heat treatment mechanism

摘要

[Purpose] In the heating furnace which is a cylindrical body, the opening of the end part with the highest heat dissipation is closed by the auxiliary heating body, and the installation mechanism of the auxiliary heating area which has been previously defined in the furnace is removed, and all the effective volume is cracked area. The purpose of the present invention is to increase the amount of material to be processed according to the volume of the crack area, to save heat, and to reduce the volume of the entire apparatus.;[Configuration] A reaction tube (1) made of quartz or silicon carbide, which can contain a support 6 in which a plurality of workpieces 5 to be subjected to vapor phase growth, thermal diffusion, or heat treatment are kept in a set posture. A device for covering the entire length of the reaction tube 1 with a cylindrical heating device 4 on the outer circumference of the opening, wherein openings at both front and rear ends of the heating device 4 are connected to the auxiliary heating body 4a. It is made by laying the reaction tube 1 which was closed and embedded in it.