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METHOD AND APPARATUS FOR REDUCING ARCING IN PLASMAMETHOD AND APPARATUS FOR REDUCING ARCING IN PLASMA PROCESSING CHAMBERS PROCESSING CHAMBERS
METHOD AND APPARATUS FOR REDUCING ARCING IN PLASMAMETHOD AND APPARATUS FOR REDUCING ARCING IN PLASMA PROCESSING CHAMBERS PROCESSING CHAMBERS
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机译:减少等离子体中弧度的方法和装置以及减少等离子体中弧度的装置加工室
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摘要
Arcing in a plasma process is reduced by shaping the target (40) and dark space shield (13) so that their peripheral regions curve away from each other, reducing electric fields and the propensity for arcing between the target and dark space shield. Also disclosed is an improved system for detecting arcing and presenting data related to detected arcs for analysis; the system generates a graph of the number of arcs, or rate of arcing, as a function of total power consumed, or alternatively a histogram of bars (120) each indicating the number of arcs having an associated magnitude.
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