METHOD FOR FORMING RESIN DRIPPING PATTERN COMPOSITION AND RESIN DRIPPING MULTILAYER FILM

摘要

A process for producing a polyisocyanate composition comprising: (A) mixing (i) an aliphatic or cycloaliphatic polyisocyanate (a) and a cyclic trimeric polyisocyanate polymer (b) obtained from the polyisocyanate (a) with (ii) two or more polycaprolactones Is mixed with the modified polyol (c), and the component (i) and the component (ii) are reacted with each other in the urethane forming reaction to obtain a surface polyisocyanate compound having a molar concentration ratio of isocyanurate groups to urethane groups of 5/5 to 1/9 (d) and block polyisocyanate obtained by blocking the residual active isocyanate group of the modified polyisocyanate compound, said block polyisocyanate having a content of effective isocyanate groups of 1 to 10 parts by weight per 100 parts by weight of the block polyisocyanate compound (B) one or more hydroxy groups having two or more hydroxy groups per molecule, A chipping-resistant coating composition containing a resin (e) as a main component; And a method of forming an extruded wing-type multilayer film comprising applying an extruded wiping coating composition on an automobile body.