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DIAMOND FILM CVD SYNTHESIS BY HIGH DENSITY DC GLOW DISCHARGE
DIAMOND FILM CVD SYNTHESIS BY HIGH DENSITY DC GLOW DISCHARGE
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机译:高密度直流辉光放电合成金刚石膜CVD
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摘要
The diamond film is deposited on a substrate by generating the plasma between the negative electrode, made by arranging the U-shape filaments of the plural number in a line, in parallel, and the positive electrode by high density DC glow discharge from glow-to-arc transition current. The temp. of the U-shape filament negative electrode must be maintained more than 2100-2300 deg.C in order to prevent the generation of arc between electrodes in the process of synthesis.
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