Surface adsorption device for hydrogen atoms using nozzles with maximum efficiency

摘要

The present invention relates to a surface gas treatment apparatus for a sample, in particular, by separating a hydrogen atom by colliding a hydrogen molecule with a heated nozzle in ultra-high vacuum, and then using a nozzle that maximizes the efficiency of adsorption with high efficiency on the surface of a semiconductor or metal It is a surface adsorption device for hydrogen atoms, and the structure is simplified by changing the electron beam acceleration method to direct electric resistance method, and the collision rate is improved by changing the shape of the nozzle that separates the hydrogen atom state through the hydrogen molecules from simple cylinder to bent shape. By attaching tantalum cover in front of the nozzle to prevent the sample surface from heating due to the radiant heat of the hot nozzle, hydrogen molecules flow in and are separated into hydrogen atoms through the heated nozzle to be released into the semiconductor or metal. Heating the atom emitter and the core nozzle It is characterized in that the tantalum cover is installed in order to block the radiant heat from the nozzle and the electrical heating device for.