Method of manufacturing ridge-type lithium niobate optical waveguide

摘要

The present invention relates to a method of manufacturing a raised type lithium niobate optical waveguide. More specifically, the present invention relates to a protruding lithium niobate optical waveguide which can obtain an etching result having a high etching rate and uniformity even at room temperature by a simple process, obtain an optical waveguide having a stable refractive index and electro-And a method for producing the same. A method of manufacturing a raised type lithium niobate optical waveguide according to the present invention includes the steps of forming a metal mask on a lithium niobate substrate and forming a proton exchange layer on a substrate by selective proton exchange; Etching the proton exchange layer by wet etching the substrate on which the proton exchange layer is formed with an etching solution; Depositing a photoresist on an electrically etched substrate and irradiating light from a bottom surface of the substrate to selectively expose the photoresist and developing the photoresist to deposit a proton exchange mask; And removing the proton exchange masks on the electric metal mask and the metal mask to proton exchange and heat treat the substrate. According to the method for manufacturing a protruding lithium niobate optical waveguide of the present invention, an etching result excellent in high etching rate and uniformity can be obtained even at room temperature by a simple process, and thus an optical waveguide can be economically produced in a short time.