首页> 外国专利> A process for the preparation of a frequency doubling structure in an optically not - linear medium, and apparatus for the frequency doubling

A process for the preparation of a frequency doubling structure in an optically not - linear medium, and apparatus for the frequency doubling

机译:在光学非线性介质中制备倍频结构的方法和倍频装置

摘要

A frequency doubling structure composed of an alternatingly poled NLO polymer is incorporated into an optically non-linear (NLO) polymeric material. This structure is made by forming a layer of a first NLO polymer, partially removing it by etching after it has been poled with the aid of a first electric field or not, such that a grating structure is formed composed of etched grooves in the polymer, and applying a layer of a second NLO polymer, such that the etched grooves are backfilled, after which the resulting alternating structure of the two NLO polymers is subjected either to a second electric field oppositely directed to the first one, or in the case of poling of the first polymer not yet having taken place, to two oppositely directed electric fields in succession. The second electric field is applied at a temperature which will not affect the poling of one NLO polymer effected by the first electric field. Further, a frequency doubler comprising an alternating structure of oppositely poled NLO polymer is provided.
机译:将由交替极化NLO聚合物组成的倍频结构并入光学非线性(NLO)聚合物材料中。这种结构是通过形成一层第一NLO聚合物制成的,在是否借助第一电场将其极化之后,通过蚀刻将其部分去除,从而形成由聚合物中的蚀刻凹槽组成的光栅结构,施加第二NLO聚合物层,以回填蚀刻过的凹槽,然后,使两种NLO聚合物的交替结构经受与第一电场相反的第二电场,或者在极化的情况下尚未发生的第一聚合物的“连续”迁移到两个相反方向的电场。在不影响由第一电场影响的一种NLO聚合物的极化的温度下施加第二电场。此外,提供了一种包括相反极性的NLO聚合物的交替结构的倍频器。

著录项

  • 公开/公告号DE69209629T2

    专利类型

  • 公开/公告日1996-10-24

    原文格式PDF

  • 申请/专利权人 AKZO NOBEL NV NL;

    申请/专利号DE1992609629T

  • 发明设计人 HORSTHUIS WINFRIED HENRI GERAR NL;

    申请日1992-12-14

  • 分类号G02F1/37;

  • 国家 DE

  • 入库时间 2022-08-22 03:41:10

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