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Removing volatile and non-volatile organic in a thick film equilibrium process and device

机译:在厚膜平衡工艺和装置中去除挥发性和非挥发性有机物

摘要

There is disclosed a method for removing a volatile component from a feed or process stream comprising (1) absorbing or adsorbing the volatile component into an absorbent or adsorbent material in an equilibrium process, wherein feed is pumped through a mixture chamber of a device, wherein the device comprises the mixture chamber and a vapor chamber, wherein the mixture chamber comprises a plurality of films comprising absorbent or adsorbent materials, wherein the film is configured to have a first side communicating with the mixture chamber and a second side communicating with the vapor chamber, and (2) removing the volatile component from the absorbent or adsorbent material by applying heat to the mixture chamber and simultaneously applying a gas phase within the vapor chamber such that the volatile component is collected in a gaseous state in the vapor chamber. There is further disclosed a device for removing a volatile component from a feed comprising an enclosed two- chambered device having a mixture chamber and a vapor chamber, wherein the mixture chamber comprises a plurality of absorbent or adsorbent materials configured to have a first side communicating with the mixture chamber and a second side communicating with the vapor chamber, wherein the absorbent or adsorbent materials comprise a thick film having a thickness of from about 0.1 mm to about 5 mm thick with optional protuberances.
机译:公开了一种从进料或工艺流中除去挥发性组分的方法,该方法包括:(1)在平衡过程中将挥发性组分吸收或吸附到吸收剂或吸附剂材料中,其中将进料泵送通过装置的混合室,其中该装置包括混合室和蒸气室,其中该混合室包括多个包含吸收性或吸附性材料的膜,其中该膜被配置为具有与混合室连通的第一侧和与蒸气室连通的第二侧。 (2)通过向混合物室加热并同时在蒸气室内施加气相,从而从吸收性或吸附性材料中除去挥发性成分,使得挥发性成分以气态收集在蒸气室内。还公开了一种用于从进料中除去挥发性成分的装置,该装置包括具有混合物室和蒸气室的封闭的两室装置,其中该混合物室包括多种吸收剂或吸附剂材料,该吸收剂或吸附剂材料的第一侧与第一侧连通。混合物室和与蒸气室连通的第二面,其中吸收剂或吸附剂材料包括厚膜,该厚膜的厚度为约0.1mm至约5mm,并具有任选的突起。

著录项

  • 公开/公告号US5472613A

    专利类型

  • 公开/公告日1995-12-05

    原文格式PDF

  • 申请/专利权人 ENVIROSEP INC.;

    申请/专利号US19940228562

  • 发明设计人 RICHARD W. SCHOFIELD;

    申请日1994-04-15

  • 分类号B01D11/00;

  • 国家 US

  • 入库时间 2022-08-22 03:39:23

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