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METHOD FOR POSITIONING CYLINDRICAL BASE MATERIAL OF APPARATUS FOR VERTICAL APPLICATION, CYLINDRICAL BASE MATERIAL FOR VERTICAL APPLICATION AND METHOD FOR VERTICAL APPLICATION
METHOD FOR POSITIONING CYLINDRICAL BASE MATERIAL OF APPARATUS FOR VERTICAL APPLICATION, CYLINDRICAL BASE MATERIAL FOR VERTICAL APPLICATION AND METHOD FOR VERTICAL APPLICATION
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机译:用于垂直应用的设备的圆柱基础材料的定位方法,用于垂直应用的圆柱基础材料和用于垂直应用的方法
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摘要
PROBLEM TO BE SOLVED: To position cylindrical base materials with less fluctuation of thickness and improved coatability by specifying the surface roughnesses of the end parts of adjoining cylindrical base materials in an apparatus for piling up the cylindrical base materials by making the cylindrical axes coincide with each other and applying a coating liq. on the outer peripheral faces while these are vertically pushed up. ;SOLUTION: A feeding means 10 for feeding cylindrical base materials 1 such as drums push up the cylindrical base materials (1A and 1B) placed on a fitting part 11 of a movable table 12 by an elevating part 14 through a hand part 15. Then, the pushed-up cylindrical base materials 1 are transferred to a carrying means 20 with gripping parts 21 and 22 and then, they are transferred to an application means 40 while they are positioned by a positioning means 30 and a coating liq. is applied on the surface. In this case, the surface roughnesses of the end parts of adjoining cylindrical base materials are set in a range of 0.5-10.0μm. It is possible thereby to obtain such effects as small fluctuation of the film thickness, good coatability, less scratches on the cylindrical base material 1 and highly accurate positioning.;COPYRIGHT: (C)1997,JPO
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