CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION AND ACID GENERATING AGENT USED FOR THE SAME

摘要

PROBLEM TO BE SOLVED: To obtain a resist compsn. having high heat resistance and high resolution, almost independent of stationary waves and giving a resist pattern of a superior shape by incorporating a specified alkali-soluble resin and an acid generating agent made of a specified oxime sulfonate compd. SOLUTION: This resist compsn. is a positive or negative type chemical amplification type resist compsn. The positive type resist compsn. contains an alkali-soluble resin having hydroxyl groups protected with acid-dissociable substituents and an acid generating agent made of an oxime sulfonate compd. represented by the formula. The ratio (Mw/Mn) of the wt. average mol.wt. of the alkali-soluble resin to the number average mol.wt. is =3.5. The negative type resist compsn. contains an alkali-soluble resin, an acid generating agent made of an oxime sulfonate compd. represented by the formula and an acid- crosslinkable substance. The ratio (Mw/Mn) of the wt. average mol.wt. of the alkali-soluble resin to the number average mol.wt. is =3.5. In the formula, R1 is an arom. group and R2 is a lower alkyl or a halogenated lower alkyl.