CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION AND ACID GENERATING AGENT USED THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a resist composition having high resolution and high sensitivity and providing a resist pattern of an excellent form by containing a film forming component whose solubility to alkali is changed by the action of acid and an acid generating agent formed of a specified oxime sulfonate compound. SOLUTION: This resist composition contains an oxide generating material formed of a film forming component whose solubility to alkali is changed by the action of acid, and an acid generating material formed of an oxime sulfonate compound represented by the formula. In the formula, R1 represents an inert organic group, and R2 represents an aromatic polycyclic hydrocarbon group, a saturated or unsaturated non-aromatic polycyclic hydrocarbon group, or a substituted derivative group thereof. Further, this resist composition contains a film forming part whose solubility to alkali is changed by the action of acid, and an acid generating agent formed of an oxime sulfonate compound represented by the formula and an onium salt.