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ECR MICROWAVE PLASMA CVD DEVICE

机译:ECR微波等离子体CVD设备

摘要

PROBLEM TO BE SOLVED: To provide technology by which, even if a film is continuously formed to a long sized one such as a magnetic tape, the film thickness and film quality remain unchanged. ;SOLUTION: This ECR microwave plasma CVD device is provided with a magnetic field generating means, a microwave generating means, a waveguide 3 for microwaves, a plasma reaction tube 1, a window 4 provided between the microwave waveguide 3 and the plasma reaction tube 1 and a feeding means feeding a film forming material to the inside of the plasma reaction tube. Then, a plasma generating means for cleaning is provided near the window.;COPYRIGHT: (C)1997,JPO
机译:要解决的问题:提供一种技术,通过该技术,即使将膜连续成型为长条状磁带(如磁带),其膜厚和质量也不会改变。 ;解决方案:此ECR微波等离子体CVD装置配备有磁场产生装置,微波产生装置,用于微波的波导3,等离子体反应管1,在微波波导3和等离子体反应管1之间提供的窗口4。供给装置将成膜材料供给到等离子体反应管的内部。然后,在窗户附近设置用于清洁的等离子体产生装置。版权所有:(C)1997,日本特许厅

著录项

  • 公开/公告号JPH09256161A

    专利类型

  • 公开/公告日1997-09-30

    原文格式PDF

  • 申请/专利权人 KAO CORP;

    申请/专利号JP19960059856

  • 申请日1996-03-15

  • 分类号C23C16/50;C30B29/04;C30B35/00;G11B5/84;

  • 国家 JP

  • 入库时间 2022-08-22 03:33:38

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