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Analysis method of metal ion concentration in plating bath

机译:电镀液中金属离子浓度的分析方法

摘要

PURPOSE:To correctly determine lead ions as well as lead and bivalent tin ions in a plating bath and also easily automate the quantification by fractionat ing plating solution from a lead alloy plating bath not containing lead or copper ions, adding iodide to have it colored, and then measuring its absorbance. CONSTITUTION:After iodide is added to plating solution to have it colored, its absorbance is measured, from which measured value lead ion concentration in a plating bath is obtained. In this case the plating bath to be analyzed is especially an electric lead or lead-allay plating bath, wherein an electric plating bath which contains aqueous lead salt substantially not containing copper ions and contains acid for dissolving the salt. Iodide to be used includes, but is not specifically limited to, KI, NaI, etc. Since there may be precipitation when iodide is added to the plating solution, complexing agent is preferably added for preventing the precipitation.
机译:目的:要正确地确定镀液中的铅离子以及铅和二价锡离子,并且还可以通过从不含铅或铜离子的铅合金镀液中分离出镀液,并加入碘化物使其着色,从而轻松实现定量的自动化,然后测量其吸光度。组成:将碘化物添加到电镀液中使其着色后,测量其吸光度,从而得出电镀液中铅离子浓度的测量值。在这种情况下,待分析的镀浴特别是电铅或铅-铅镀浴,其中,电镀浴包含基本上不含铜离子的含水铅盐并且包含用于溶解该盐的酸。所使用的碘化物包括但不限于KI,NaI等。由于当将碘化物添加到镀覆溶液中时可能会沉淀,因此优选添加络合剂以防止沉淀。

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