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The hard diamond condition carbon film fit well is formed the manner

机译:硬金刚石条件碳膜很好地契合形成方式

摘要

PURPOSE:To improve the adhesin of a hard diamondlike carbon film to a metallic base material without deforming or deteriorating the base material by forming a layer of Co, Cr, Ni or an alloy of them on the surface of the base material and forming the carbon film on the layer by CVD. CONSTITUTION:An underlayer of one or more among Co, Cr and Ni or an alloy of them is formed on the surface of a metallic base material to about 10nm-100mum thickness. A hard diamondlike carbon film is formed on the underlayer by CVD, preferably high frequency plasma CVD with a gaseous hydrocarbon/hydrogen mixture. Thus, the diamondlike carbon film can be formed on the surface of the metallic base material with satisfactory adhesion. By this surface treatment, superior wear and corrosion resistances and decorativeness can be provided to the metal.
机译:用途:通过在基材表面上形成一层Co,Cr,Ni或它们的合金层并形成碳,来改善类金刚石硬质碳膜对金属基材的粘附力,而不会使基材变形或劣化。通过CVD在该层上形成薄膜。组成:在金属基材的表面上形成一层Co,Cr和Ni或它们的合金中的一层或多层的底层,厚度约为10nm至100μm。硬质类金刚石碳膜通过CVD,优选地是高频等离子体CVD,利用气态烃/氢混合物形成在底层上。因此,可以在金属基材的表面上以令人满意的粘附力形成类金刚石碳膜。通过这种表面处理,可以为金属提供优异的耐磨性和耐腐蚀性以及装饰性。

著录项

  • 公开/公告号JP2628595B2

    专利类型

  • 公开/公告日1997-07-09

    原文格式PDF

  • 申请/专利权人 住友電気工業株式会社;

    申请/专利号JP19870094301

  • 发明设计人 土居 陽;

    申请日1987-04-18

  • 分类号C23C16/26;C23C16/02;C23C16/50;C30B29/04;

  • 国家 JP

  • 入库时间 2022-08-22 03:28:34

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