Carbon-coated barrier films with increased concentration of tetrahedrally-coordinated carbon

摘要

Carbon is deposited on a substrate through plasma enhanced chemical vapor deposition of a decomposable processor containing a seed material additive. The seed material is a hydrocarbon having a high concentration of sp3 tetrahedrally-coordinated carbon. The seed material provides a template for the replication of sp3 tetrahedrally-coordinated carbon atoms in the deposited amorphous carbon coating.