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Electrochemical measurements for in-situ monitoring of semiconductor wafer cleaning processes
Electrochemical measurements for in-situ monitoring of semiconductor wafer cleaning processes
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机译:用于现场监测半导体晶圆清洗过程的电化学测量
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摘要
The method for monitoring the physical or chemical action of a chemical solution on a surface of a semiconductor material in contact with said chemical solution comprising:a. measuring the potential difference between a working electrode and a reference electrode, said reference electrode being in contact with said chemical solution, thereby obtaining measurement data,b. obtaining condition data which indicate the physical and/or chemical condition of said semiconductor material over a predetermined period of time; andc. correlating said condition data to said measurement data in order to monitor the physical or chemical action of said chemical solution on said surface.展开▼