Wet process equipment

摘要

And a wet process apparatus for manufacturing a semiconductor device. The present invention is characterized in that a wet process apparatus for performing a process using a chemical solution is provided with a means for reversing the upper and lower positions of the wafers installed in the first process tank for performing the wet process until the process is completed To provide a wet process apparatus.;According to the present invention, since the vertical position of the wafer at the initial stage of loading is reversed before unloading, the problem that the reaction progress time varies according to the position of the wafer is solved, and uniform reaction results can be obtained over the entire wafer surface .