DEVICE TO REMOVE IMPURITIES FROM SURFACES OF SUBSTRATE ORIENTED IN MISHITTED PLANES WITH MAINTENANCE OF MOLECULAR CRYSTALLINE STRUCTURE OF TREATED SURFACES OF SUBSTRATE

摘要

FIELD: microelectronics. SUBSTANCE: proposed device is meant for removal of undesirable surface impurities from surface of substrate having flat or irregular shape by high-energy radiation. Device removes undesirable surface impurities without change of substrate located below molecular crystalline structure of substrate 12. Source of high-energy radiation incorporates pulse or continuous action laser 14 or high-energy lamp. EFFECT: enhanced functional efficiency of device.