首页> 外国专利> Photo emission electron beam measuring probe with pulsed laser

Photo emission electron beam measuring probe with pulsed laser

机译:脉冲激光光发射电子束测量探头

摘要

An electron-beam test probe system (400) in which a pulsed laser-beam source (404) and a photocathode assembly (430) are used with an electron-beam column (426) to produce a pulsed electron beam at a stabilized repetition frequency. A pulse picker (414) allows the pulse repetition frequency of the pulsed electron beam to be reduced to a submultiple of the pulsed laser repetition frequency. A test pattern generator (416) is programmable to apply a desired pattern of test vector patterns to an electronic circuit to be probed, the test vector patterns being synchronized with the stabilized laser-beam pulse repetition frequency. A timebase circuit (412) allows the test vector patterns to be time-shifted relative to the pulsed electron beam. The electronic circuit under test can thus be probed at any desired point in the applied test vector pattern by control of the pulse picker and by time-shifting the test vector pattern.
机译:电子束测试探针系统(400),其中脉冲激光束源(404)和光电阴极组件(430)与电子束柱(426)一起使用,以稳定的重复频率产生脉冲电子束。脉冲拾取器(414)允许将脉冲电子束的脉冲重复频率减小到脉冲激光重复频率的约数。测试图案发生器(416)是可编程的,以将期望的测试矢量图案施加到待探测的电子电路,测试矢量图案与稳定的激光束脉冲重复频率同步。时基电路(412)允许测试矢量图案相对于脉冲电子束时移。因此,通过控制脉冲拾取器并通过时移测试矢量图案,可以在施加的测试矢量图案中的任何所需点上探测被测电子电路。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号