Photo mask for a process margin test and a method for performing a process margin test using the same

• 1. 一种裕度测试方法、裕度测试系统及相关装置 [P] . 中国专利： CN112948189A . 2021-06-11
• 2. 电压裕度测试装置和电压裕度测试方法 [P] . 中国专利： CN102540051A . 2012-07-04
• 3. Photo mask for a process margin test and a method for performing a process margin test using the same [P] . 英国专利： GB2314941B . 2000-06-14

  机译： 用于工艺裕度测试的光掩模以及使用该掩模进行工艺裕度测试的方法

• 4. Photo mask for a process margin test and a method for performing a process margin test using the same [P] . 美国专利： US5776640A . 1998-07-07

  机译： 用于工艺裕度测试的光掩模以及使用该掩模进行工艺裕度测试的方法

• 5. Photo mask for process Margin test utilizes this the process Margin test manner [P] . 日本专利： JP2943770B2 . 1999-08-30

  机译： 用于过程裕量测试的光掩膜利用此过程裕量测试方式

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