首页> 外国专利> Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling

Inductively coupled RF plasma reactor with floating coil antenna for reduced capacitive coupling

机译:具有浮动线圈天线的电感耦合RF等离子电抗器,可减少电容耦合

摘要

In an inductively coupled RF plasma reactor having an inductive coil antenna connected through an RF impedance match network to an RF power source, capacitive coupling from the antenna to the plasma is reduced by isolating the coil antenna from the RF power source by an isolation transformer, so that the potential of the coil antenna is floating. The output of the RF impedance match network is connected across the primary winding of the isolation transformer while the floating coil antenna is connected across the secondary winding of the isolation transformer.
机译:在具有通过RF阻抗匹配网络连接到RF电源的电感线圈天线的电感耦合RF等离子反应器中,通过使用隔离变压器将线圈天线与RF电源隔离,可以减少从天线到等离子体的电容耦合,因此线圈天线的电位是浮动的。 RF阻抗匹配网络的输出跨接在隔离变压器的初级绕组两端,而浮动线圈天线跨接在隔离变压器的次级绕组两端。

著录项

  • 公开/公告号US5683539A

    专利类型

  • 公开/公告日1997-11-04

    原文格式PDF

  • 申请/专利权人 APPLIED MATERIALS INC.;

    申请/专利号US19950480174

  • 发明设计人 XUE-YU QIAN;ARTHUR H. SATO;

    申请日1995-06-07

  • 分类号C23F1/02;

  • 国家 US

  • 入库时间 2022-08-22 03:09:05

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号