Experimental Characterization of Dual-Frequency Capacitively Coupled Plasma with Inductive Enhancement in Argon

摘要

The dual-frequency capacitively coupled plasma(DF-CCP)with inductive enhancement system is a newly designed plasma reactor.Different from the conventional inductively coupled plasma(ICP)reactors,now a radio frequency(rf)power is connected to an antenna placed outside the chamber with a one-turn bare coil placed between two electrodes in DF-CCP.This paper gives a detailed description of its structure.Moreover,investigations on some characteristics of discharges in this apparatus were made via a Langmuir probe.