首页> 外国专利> DOUBLE SYMMETRIC MAGNETIC LENSES AND TWO STEP MAGNETIC LENS SYSTEM

DOUBLE SYMMETRIC MAGNETIC LENSES AND TWO STEP MAGNETIC LENS SYSTEM

机译:双对称磁透镜和两步磁透镜系统

摘要

PROBLEM TO BE SOLVED: To provide double symmetric magnetic lenses which improve a non- focused image caused by an aberration of an optical system. ;SOLUTION: A double symmetric magnetic lenses for a charged corpuscular ray aligner is provided to apply a corpuscular ray passing through a pattern of a reticule 1 to a wafer 2, in order to form a pattern image on the wafer 2. In this aligner, the length of lens S is specified to satisfy a relation of L[1-{1/(m-0.5)}≤S≤L[1-{1/(m+1)}], where a lens-barrel length of the double symmetric magnetic lens is L, and a rate of reduction is 1/m, and a lens length of the reticule side lens 3 arranged to the reticule side to construct the double symmetric magnetic lenses is S, and accordingly an image being not focused can be improved as mush as possible.;COPYRIGHT: (C)1998,JPO
机译:要解决的问题:提供双对称磁性透镜,该透镜可改善由光学系统像差引起的非聚焦图像。 ;解决方案:提供了一种用于带电微粒射线对准器的双对称磁性透镜,用于将穿过标线1的图案的微粒射线施加到晶片2上,以便在晶片2上形成图形图像。规定透镜S的长度满足L [1- {1 /(m-0.5)}≤S≤L[1- {1 /(m + 1)}]的关系,其中镜筒长度为双对称磁透镜为L,缩小率为1 / m,配置在分划板侧以构成双对称磁透镜的分划板侧透镜3的透镜长度为S,因此图像未聚焦可以得到最大的改善。;版权所有:(C)1998,JPO

著录项

  • 公开/公告号JPH10255705A

    专利类型

  • 公开/公告日1998-09-25

    原文格式PDF

  • 申请/专利权人 NIKON CORP;

    申请/专利号JP19970059070

  • 发明设计人 OKAMOTO KAZUYA;KOJIMA SHINICHI;

    申请日1997-03-13

  • 分类号H01J37/141;G03F7/20;H01J37/305;H01L21/027;

  • 国家 JP

  • 入库时间 2022-08-22 03:07:57

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