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Wide wavelength area bimusupuritsuta, optical device, production manner and light beam duplex process null of wide wavelength area
Wide wavelength area bimusupuritsuta, optical device, production manner and light beam duplex process null of wide wavelength area
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机译:宽波长区域bimusupuritsuta,光学装置,生产方式和宽波长区域的光束双工工艺无效
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摘要
PURPOSE: To obtain a beam splitter or an optical element allowed to be used in a wide wavelength area and constituted of an uncoated transparent substance by constituting the beam splitter of a transparent substance allowed to be driven in a wavelength area from a specific ultraviolet region up to an infrared region and having parallel uncoated surfaces and a specific thickness. ;CONSTITUTION: The beam splitter is constituted of a thick plate 34 consisting of a transparent substance to be driven in an wavelength region from a deep ultraviolet region of 190 nanometer wavelength up to the infrared region and has two parallel uncoated surfaces 42, 44. The plate 34 is formed by a transparent substance such as sapphire and melted silica, having a thickness of ≤0.15mm. Thereby an incident beam 36 projected to the plate 34 at an 45° angle generates a parallel outgoing beam 46 and double reflection beams 38, 40 reflected from the front and rear faces 42, 44 of the plate 34 and the beams 38, 40 close to each other are projected as a single beam. Since reflection preventing members or non-reflection coats are not formed on both the surfaces of the wide wavelength region beam splitter, beam energy is not absorbed and the transmission and reflection characteristics of the beam splitter are improved.;COPYRIGHT: (C)1993,JPO
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