EVAPORATION SOURCE AND VACUUM TREATMENT CHAMBER PROVIDED WITH EVAPORATION SOURCE, AND FORMING METHOD OF ORGANIC COMPOUND FILM

摘要

PROBLEM TO BE SOLVED: To eliminate impurities of raw material monomer in an evaporation sources by installing a cooling through heating equipment and an exhauster in at least one out of evaporation sources. ;SOLUTION: After valves 10, 13 are opened and the pressure in an evaporation source 1a is set, a raw material monomer 3 in an evaporation tank 2 is heated and sublimated by an evaporation source heater 5 and made to stick on a cooled cylindrical vessel 9 in a vacuum vessel 6 of an evaporation source 1b. The valves 10, 13 are closed, the cooling of the vessel 9 is stopped, and the monomer 3 sticking on the vessel 9 is heated by a vacuum vessel heater 7. A valve 14 is opened, and the monomer 3 is introduced into a vacuum treatment chamber from a monomer nozzle. The raw material monomer is once subjected to vacuum treatment between the evaporation source and the heating cooling equipment. Thereby raw material monomer of organic compound of high impurity can be easily obtained.;COPYRIGHT: (C)1998,JPO