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By microwave plasma CVD method the diamond membrane synthetic device

机译:通过微波等离子体CVD法的金刚石膜合成装置

摘要

PURPOSE:To make a diamond film uniform in thickness by supplying electric current to an electromagnetic coil placed around a reaction chamber and applying a proper magnetic field to plasma. CONSTITUTION:A gaseous methane-H2 mixture is introduced into a reaction chamber 13 fro(n a feed pipe 14 and microwaves generated by a microwave oscillator 11 are introduced into the chamber 13 through a chamber 12 with an inverted funnel-shaped end to generate plasma between the top of the chamber 13 and a substrate 17. At the same time, electric current is supplied to a circular electromagnetic coil 18 placed around the chambers 13, 12 and a generated electric field is applied to the plasma to synthesize a diamond film of a uniform thickness on the substrate 17.
机译:目的:通过向位于反应室周围的电磁线圈供电并向等离子体施加适当的磁场,使金刚石膜的厚度均匀。组成:将气态甲烷-H2混合物从进料管14引入反应室,由微波振荡器11产生的微波通过具有倒漏斗形端部的室12引入室13中,从而在同时,将电流提供给放置在腔室13、12周围的圆形电磁线圈18,并将产生的电场施加到等离子体上,以合成a的金刚石膜。基板17上的厚度均匀。

著录项

  • 公开/公告号JP2805506B2

    专利类型

  • 公开/公告日1998-09-30

    原文格式PDF

  • 申请/专利权人 電気興業株式会社;

    申请/专利号JP19890216938

  • 发明设计人 大平 義和;石堀 宏一;

    申请日1989-08-23

  • 分类号C30B29/04;C23C16/26;C23C16/50;

  • 国家 JP

  • 入库时间 2022-08-22 03:02:15

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