Creation manner null of heating profile for analysis of heating evaporation introduction device which is used for the inductive coupling plasma mass spectrometry

摘要

PURPOSE: To find a temperature-increase profile for analysis which can detect a specific element with the highest sensitivity by using one type of simulation temperature-increase profile. ;CONSTITUTION: An ashing stage and a vaporization stage are indexed from a vaporization starting temperature which is shown by a mass spectrum which is obtained by heating a target to be analyzed according to a simulation temperature-increase profile A where first to fifth five stages A₁-A₅ are provided at an equal spacing and from the temperature of the maximum sensitivity, respectively.;COPYRIGHT: (C)1993,JPO&Japio